Manage dynamic contact resistance drift by isolating sense lines with four-wire Kelvin probes and active cooling to prevent electrothermal asperity creep.
Surface roughness forces high-frequency current through isolated micro-asperities, increasing contact resistance and insertion loss as skin depth shrinks.
Monitor probe contact resistance drift dynamically to replace worn pins before false failures corrupt production yield metrics and inflate testing costs.
Contact oxide growth adds up to 3 dB insertion loss in RF interconnects, degrading link margin and driving retransmissions unless wiping force exceeds 0.3 N.
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